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" The Dopant Density and Temperature Dependence of Electron Mobility and Resistivity in n-Type Silicon, "
Analysis and Simulation of Semiconductor Devices - Seite 121
von S. Selberherr - 1984 - 293 Seiten
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NBS Special Publication, Ausgaben 400-431

1977 - 798 Seiten
...Intrinsic Concentration in Silicon, Solid-State Electronics 10, 1039-1051 (1967) . 12. Li, SS, and Thurber, WR , The Dopant Density and Temperature Dependence of Electron Mobility and Resistivity in ff-Type Silicon, Solid-State Electronics, to be published (1977). 13. Conwell, E., and Weisskopf, VF,...
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Monthly Catalogue, United States Public Documents

1978 - 1326 Seiten
...systems I, 77-6745 Technical profile of seven data element dictionary/directory systems., 77m¿ 6745 The dopant density and temperature dependence of electron mobility and resistivity in n-type silicon I, 77-7683 Electron ¿ micronualyals — Congresses. Use of Monte Carlo calculations in eectron probe...
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Scientific and Technical Aerospace Reports, Band 15

1977 - 1052 Seiten
...sub 1-х P sub x alloy systems I.AD-A025294] 02 o0264 N77-118*9 Semiconductor measurement technology: The dopant density and temperature dependence of electron mobility and resistivity in N-lype silicon [PB-264I21/51 15 p2059 N77-24976 LI, ST Electromagnetic system interaction algorithms...
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NBS Special Publication, Ausgaben 400-441

1977 - 926 Seiten
...contact for additional information: RI Scace. 9. REFERENCES Li, SS, and Thurber, WR , The Dop- 12. ant Density and Temperature Dependence of Electron Mobility and Resistivity in n-Type Silicon, Solid-State Electronics 20, 609-616 (1977). Li, SS, Semiconductor Measurement 13. Technology: The Dopant Density...
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Publications

United States. National Bureau of Standards - 1978 - 618 Seiten
...important contributions of autoionization to ionization and fragmentation at higher energies. 17147. Li, SS, Thurber, WR, The dopant density and temperature...electron mobility and resistivity in ntype silicon, Solid-Slate Electron. 20, 609-616 (1977). Key words: dopant density; electron-electron scattering;...
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Process and Device Simulation for MOS-VLSI Circuits

P. Antognetti - 1983 - 644 Seiten
...Coefficient in One— sided Abrupt Junctions", Solid-State Electron., Vol.19, pp. 875-881, 1976. /92/ Li SS, Thurber WR , "The Dopant Density and Temperature...Dependence of Electron Mobility and Resistivity in n-Type /93/ Liu S., Hoefflinger B., Pederson DO, "Interactive Two— Dimensional Design of Barrier Controlled...
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Semiconductor Measurement Technology

National Institute of Standards and Technology (U.S.), National Institute of Standards and Technology (U.S.). - 1994 - 76 Seiten
...Pattern NBS-4, WR Thurber and MG Buehler (April 1978). 400-33 Semiconductor Measurement Technology. The Dopant Density and Temperature Dependence of Electron Mobility and Resistivity in N-Type Silicon, SS Li (March 1977). 400-34 Semiconductor Measurement Technology. Safe Operation of Capacitance Meters...
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National Semiconductor Metrology Program

National Institute of Standards and Technology (U.S.), National Semiconductor Metrology Program (U.S.) - 1995 - 152 Seiten
...(March 1977). 400-32 Microelectronic Test Pattern NBS-4, WR Thurber and MG Buehler (April 1 978). 400-33 The Dopant Density and Temperature Dependence of Electron Mobility and Resistivity in N-Type Silicon, SS Li (March 1977). 400-34 Safe Operation of Capacitance Meters Using High Applied-Bias Voltage, AM...
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Advanced Physical Models for Silicon Device Simulation

Andreas Schenk - 1998 - 384 Seiten
...296 and 77 K. IEEE Trans. Electron Devices, 40(10):1872-75, 1993. [ 1 . 1 69] SS Li and WR Thurber. The Dopant Density and Temperature Dependence of Electron...Mobility and Resistivity in n-Type Silicon. Solid-State Electronics, 20:609-16, 1977. [1.1 70] W. Lochmann and A. Haug. Phonon-Assisted Auger Recombination...
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Low Temperature Electronics: Physics, Devices, Circuits, and Applications

Edmundo A. Gutierrez-D., M. Jamal Deen, Cor L. Claeys - 2001 - 985 Seiten
...impurity scattering in semiconductors," Phys. Rev. 104, 1559-1567 (1956). 59. SS Li and WR Thurber, "The dopant density and temperature dependence of...silicon," SolidState Electron. 20, 609-616 (1977). 60. K. Yamaguchi, "A mobility model for carriers in the MOS inversion layer," IEEE Trans. Electron...
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